| 摘要 |
An improved short channel field effect transistor is provided which includes a semiconductor substrate having a given type dopant with source and drain electrodes, one of the electrodes having a diffusion of the type of dopant opposite to that of the given type dopant, a channel disposed between the source and drain electrodes, a region having the same type dopant as that of the substrate and aligned with the diffusion at the diffusion-channel interface, the region having sufficient dopant to prevent penetration of the depletion region generated by the diffusion into the substrate or at least to significantly limit the electric field which results from the junction between the diffusion and the substrate and an electrically conductive contact made with the diffusion, which may be, e.g., connected to a substantially constant bias or supply voltage source.
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