| 摘要 |
The laser heat treatment improves the homogeneity of silicon during the phase transformation from amorphous silicon to polycrystal silicon. The heattreatment comprises (A) forming an amorphous silicon layer (2) on a glass (1); (B) forming a supplementary layer (3) with small humps on the amorphous silicon layer; (C) overlappingly irradiating the thicker region of the supplementary layer.
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