| 摘要 |
<p>Positive working photoresist compsn. comprises: (a) a water-insol., alkaline-soluble polymer; (b) a photo acid generator of formula (I); and (c) a mixed carbonate ester of tert. butyl alcohol and a poly:hydric alcohol which is a discrete acid labile inhibitor of the dissolution of the polymer. Q is diazonaphthoquinone gp.; R is H or -CH2OS(=O)2-Q; R1 is H, hydroxyl or -O-S(=O)2-Q; R12 is H or lower alkyl; and X is H or nitro gp. with the proviso that R2 is lower alkyl when X is nitro. Pref., in (I), R-R2 and X are H or R1 is -O-S(=O)2-Q, R2 is lower alkyl and X is nitro. Pref., the generator is tri-(2,1,4-diazonaphthoquinonesulphonate) ester of 3,5-dinitro-2,6-dimethylol para cresol and may further contain a 1-naphthalene sulphonic acid 3-diazo-3,4-dihydro-4-oxo ester of a cresol formaldehyde polymer.</p> |
