| 摘要 |
PURPOSE:To improve electrically dielectric breakdown voltage by forming a layer containing a crystalline glass or the like such as SiO2 and a pigment or the like and a layer of an amorphous glass such as PbO as a glass for the insulating coating of prescribed electronic parts. CONSTITUTION:A wiring circuit (A) is obtained by forming Ag, Ag-Pd or the like on an insulating substrate of the electronic parts. Next, the layer (B) of crystalline glass containing 70-95% crystalline glass which contains 35-45wt.% SiO2 (hereafter %), 2-6.5% Al2O3, 12-18% ZnO, 0-40% MgO, 0-40% CaO, 0-40% SrO, 0-40% BaO, 30-40% MgO+CaO+SrO+BaO or the like, and 5-30% filler or pigment is formed on the component A. Next, the layer (C) of amorphous glass containing 52-60% PbO, 22-30% SiO2 or the like is formed on the layer (B). Thus, the electronic parts for highly insulated coating satisfying >=2000 V dielectric breakdown voltage is produced by coating the component (A) with the (B) and (C) layers as a glass (D) for insulating coating. |
