PLASTIC FILM MATERIAL IMPARTED WITH ANTISTATICITY

摘要

PURPOSE:To obtain a plastic film material or a silver halide photosensitive material resistant to generation of pressure fogging and scratch damage, having high transparency and exhibiting high antistatic performance even under low humidity condition. CONSTITUTION:This plastic material contains fine particles having a volume resistivity of <=10<9>OMEGAcm and is composed mainly of nonmetallic element. A plastic material or a silver halide photosensitive material contains these particles having an average particle diameter of <=1mum and/or having a specific gravity of <=3.0.