发明名称 SYSTEM FOR SPUTTERING COMPOSITIONS ONTO A SUBSTRATE
摘要 An apparatus for producing a composite film of several elements on a substrate (25) such as a magnetic disk for a disk drive. The apparatus includes a sputtering chamber (30) and at least a first and second sputtering magnetrons (621 - 624) associated with a first target comprising a first component and a second target comprising a second component. A rotating chuck (50) is positioned in the chamber opposite the targets and a substrate (25) is mounted thereon and rotated so that target elements are simultaneously sputtered achieving a multi-component film coating on the surface of the substrate (25) with an even film gradient. In one embodiment, four targets each target comprising one of an element or composition of elements to be sputtered, are mounted abutting four magnetron assemblies (621 - 624).
申请公布号 WO9419508(A1) 申请公布日期 1994.09.01
申请号 WO1994US01896 申请日期 1994.02.18
申请人 CONNER PERIPHERALS, INC. 发明人 HOLLARS, DENNIS, R.;BONIGUT, JOSEF;WARD, KEITH, A.
分类号 C23C14/34;C23C14/35;C23C14/50;G11B5/84;G11B5/85;G11B5/851;H01F41/18;H01J37/34;H01L21/00;(IPC1-7):C23C14/34 主分类号 C23C14/34
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