| 摘要 |
In an appliance for retaining substrates (2, 2', ...) in the vacuum chamber of a deposition or etching system, a plate-like substrate seat (3) is provided, it being possible to place onto the substrate seat (3) a frame section (4) which covers it, engages over the substrates (2, 2', ...), has a number of holes (6) corresponding to the number and the configuration of the substrates (2, 2', ...), and can be secured, with the aid of clamping pieces, to the substrate seat (3). On the top of the substrate seat (3) retaining discs (15, 15', ...) are arranged permanently, whose top supports one sealing ring (19, 19', ...) each, the substrates (2, 2', ...) being supported by the sealing rings (19, 19', ...) and the gap space (25) formed in each case between the retaining discs and the substrates (2, 2', ...) being connectable via ducts or holes (14, 14', ...) to a vacuum source or, for cooling purposes, to a gas source. <IMAGE>
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