A plasma is generated by applying a voltage on mutually spaced apart spots of a microporous body. This may be done for example by applying a 50 to 100 V voltage through a microporous layer of a silicium wafer.
申请公布号
WO9419832(A1)
申请公布日期
1994.09.01
申请号
WO1994EP00400
申请日期
1994.02.11
申请人
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWAND;LANG, WALTER;KOZLOWSKI, FRANK;RICHTER, AXEL;SAUTER, MARTIN;STEINER, PETER
发明人
LANG, WALTER;KOZLOWSKI, FRANK;RICHTER, AXEL;SAUTER, MARTIN;STEINER, PETER
