| 摘要 |
<p>A process for forming a three-dimensional structure etched in a substrate (501) with perfect convex corners includes partitioning the structure into two features (502-504, 505) such that the exterior corners are formed by the intersection (506) of the two features; etching the first feature (502-504); forming an etch mask on the surface and on the substrate of the etched first feature; opening a window in the etch mask on the substrate to define the second feature; and etching the second feature (505), thereby obtaining the desired structure.</p> |
