发明名称 |
POLYMERS WITH INTRINSIC LIGHT-ABSORBING PROPERTIES |
摘要 |
A composition and a method for forming an anti-reflective layer for DUV microlithographic processes is disclosed. The compositions of the present invention includes a polymer dissolved in a suitable solvent. The polymers are polysulfone and polyurea polymers which possess inherent light absorbing properties at deep ultraviolet wavelengths. In accordance with the method of the present invention, these compositions are applied to a substrate to form an anti-reflective coating, and thereafter a photoresist material that is compatible with the anti-reflective coating is applied. |
申请公布号 |
WO9419396(A1) |
申请公布日期 |
1994.09.01 |
申请号 |
WO1993US01849 |
申请日期 |
1993.02.18 |
申请人 |
BREWER SCIENCE, INC. |
发明人 |
FLAIM, TONY;LAMB, JAMES, III;MOECKLI, KIMBERLY, A.;BREWER, TERRY |
分类号 |
C08G18/38;C08G75/23;C08G83/00;C08J3/09;G03F7/09;(IPC1-7):C08J3/21;C08L81/00;C08K5/36 |
主分类号 |
C08G18/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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