| 摘要 |
PURPOSE:To form a work with high precision inflicting no thermal loss on the work at all by a method wherein a positive type resist layer is formed on the surface of work through the intermediary of an acrylic resist layer, a fluoride thin layer and an alcohol impregnated thin layer. CONSTITUTION:An acrylic resist layer 3 is formed on the surface of a work 1. Firstly a thin layer 41 comprising fluoride i.e. the same material as that of layer 3 is formed on the surface side of layer 3. Secondly an alcohol-impregnated thin film 42 is formed on the surface side of layer 41. Thirdly a positive type photoresist layer 4 is formed on the layer 42 by means of coating and baking positive type resist material and then another layer 44 comprising mixed materials of layers 3, 41 and 4 is formed substituting for the layers 41, 42 between the layers 3 and 4 to make the layers 3, 44 form a laminated body 45. Fourthly a resist layer 8 is formed by means of specifically patterning the layer 4. Finally another laminated body 50 is formed by means of ion-etching process utilizing the layer 8 as a mask. Through these procedures, a mask may be formed of the laminated body 50 with high precision and excellent reproducibility. |
