发明名称 SINGLE-SIDED SURFACE POLISHING
摘要 PURPOSE:To prevent the generation of faults on the surface of a substrate due to the abrasion chip by forming a recess on the edge surface of a carrier and attaching a soft cloth on the part ranging from the recessed part to the carrier side surface part, in the polishing for a workpiece which is inserted through a cloth into a carrier. CONSTITUTION:As for the single-sided surface polishing in which a carrier having a hole for accommodating a workpiece is installed on a pressure plate, and polishing work is carried out, supplying the polishing liquid in which the polishing material such as cerium cxide is suspended in water. A recess is formed on the carrier, in a certain depth, e.g. 0.5-1.5mm along the carrier surface from the carrier edge surface part where the carrier and the workpiece contact. A soft cloth is attached on the part ranging from the recessed part to the carrier side surface part. The recess has a width (5mm or more) from the carrier side surface in contact with a base plate to the outer periphery, and the depth is set larger than the thicknes of the soft cloth. As the soft cloth, is used the foamed polyurethane nonwoven fabric.
申请公布号 JPH06238559(A) 申请公布日期 1994.08.30
申请号 JP19920131729 申请日期 1992.04.24
申请人 SHIN ETSU CHEM CO LTD 发明人 SHIBANO YUKIO;MIHARADA SATORU;TAKITA MASATOSHI
分类号 B24B37/27;B24B37/28 主分类号 B24B37/27
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