发明名称 |
Apparatus for processing a sample using a charged beam and reactive gases |
摘要 |
A method of processing a sample using a charged beam and reactive gases and a system employing the same, the method and system being able to perform the reactive etching and the beam assisted deposition using a charged particle detector free from the degradation of the performance due to the reactive gas. The system is designed in such a way that a shutter mechanism is provided in the form of the charged particle detector, and a chamber for accommodating the charged particle detector can be evacuated. In the observation of the sample, the charged particle detector is turned on to open the shutter mechanism, and in the processing of the sample, the charged particle detector is turned off or left as it is to shut the shutter mechanism to evacuate the inside of the charged particle detector.
|
申请公布号 |
US5342448(A) |
申请公布日期 |
1994.08.30 |
申请号 |
US19930040842 |
申请日期 |
1993.03.31 |
申请人 |
HITACHI, LTD. |
发明人 |
HAMAMURA, YUUICHI;HARAICHI, SATOSHI;SHIMASE, AKIRA;AZUMA, JUNZOU;ITOH, FUMIKAZU;YAMADA, TOSHIO;KOIZUMI, YASUHIRO;MIZUMURA, MICHINOBU |
分类号 |
H01J37/244;H01J37/317;(IPC1-7):H01J37/30 |
主分类号 |
H01J37/244 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|