| 摘要 |
The invention relates to an apparatus and method for polishing run-out table rolls. The apparatus includes a polishing block assembly having linked abrasive blocks and a positioning apparatus to position the blocks in contact with the surface of the run-out table rolls that are to be polished. The method includes the steps of positioning the assembly over the rolls, lowering the assembly into contact with the rolls, transporting the assembly in a linear direction over the rolls to effect the polishing and thereafter removing the assembly from the rolls.
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