Hydroxypolyimides and high temperature resistant positive photoresists,申请号HK19940000859-传众专利搜索

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发明名称	Hydroxypolyimides and high temperature resistant positive photoresists
摘要
申请公布号	HK85994(A)	申请公布日期	1994.08.26
申请号	HK19940000859	申请日期	1994.08.18
申请人	HOECHST CELANESE CORPORATION	发明人	KHANNA, DINESH N.;MUELLER, WERNER H., DR.
分类号	G03C1/72;C08G73/10;C08L79/08;C09D179/08;G03F7/023;G03F7/038;(IPC1-7):C08G73/10;G03F7/016;G03F7/022	主分类号	G03C1/72
代理机构		代理人
主权项
地址

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