Process for chemical vapor deposition.,申请号EP19880309324-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	Process for chemical vapor deposition.
摘要
申请公布号	EP0311401(B1)	申请公布日期	1994.08.24
申请号	EP19880309324	申请日期	1988.10.06
申请人	FUJITSU LIMITED	发明人	KIMURA, TAKAFUMI;YAMAWAKI, HIDEKI;IKEDA, KAZUTO;IHARA, MASARU
分类号	C01G1/00;C01G3/00;C04B41/87;C23C16/40;H01B12/06;H01B13/00;H01L39/24;(IPC1-7):H01L39/24	主分类号	C01G1/00
代理机构		代理人
主权项
地址

您可能感兴趣的专利

Method for cleaning polysilicon

Dirt collecting system for a vacuum cleaner

Positioning unit and positioning apparatus with at least two positioning units

Fitting and comfort system with inflatable liner for helmet

Louvered screen to control light

Apparatus for storing and transporting cellular matrices

Apparatus for issuing commodity codes for commodity model names

Method for registering user information to exchange message on network

Sustained release pharmaceutical composition and method of releasing pharmaceutically active agent

Binding and catalysis screen for high throughput determination of protein function using chemical inducers of dimerization

Integrated tissue poration, fluid harvesting and analysis device, and method therefor

Mammalian TNF-alpha convertases

RECOMBINANT EXPRESSION OF S-LAYER PROTEINS

PROCESS FOR PREPARING AN ANTI-OXIDANT

AMINO ACID SEQUENCE

Mitofusins, Fzo homologs and functional derivatives thereof

Prion protein dimers useful for vaccination

ANTIBODIES FOR INHIBITING BLOOD COAGULATION AND METHODS OF USE THEREOF

Method, system, and computer-program product for the customization of drop-down list boxes using hot lists

Disk device having cash memory