| 发明名称 |
METHOD FOR DEPOSITING ALUMINUM LAYERS ON INSULATING OXIDE SUBSTRATES. |
| 摘要 |
A manufacturing method which includes forming a metallic, aluminum-containing layer (10) adherent to a surface of a body (20). The method includes the steps of depositing aluminum on the surface from an aluminum-containing vapor, and during the aluminum-depositing step, the further step of depositing arsenic, phosphorus, or antimony on the surface from the vapor. <IMAGE> |
| 申请公布号 |
EP0604036(A3) |
申请公布日期 |
1994.08.24 |
| 申请号 |
EP19930309630 |
申请日期 |
1993.12.02 |
| 申请人 |
AT&T CORP. |
发明人 |
CUNNINGHAM, JOHN EDWARD;JAN, WILLIAM YOUNG;RENTSCHLER, JOHN ANDERSON;WARWICK, COLIN ALAN |
| 分类号 |
C23C14/06;H01L21/203;H01L21/3205;H01L21/768;H01L23/532;(IPC1-7):H01L21/90;H01L23/485;H01L21/320 |
主分类号 |
C23C14/06 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
