发明名称 |
Plasma CVD method |
摘要 |
A plasma CVD method and the device for generating an arc discharging plasma, together with introducing both a material gas and a reactive gas into a vacuum chamber; coating a substrate with a thin film which contains a material gas component and a reactive gas component, said plasma CVD method comprising the steps of: introducing said material gas into a position between the arc discharging plasma and the substrate; and introducing said reactive gas into a space opposite, relative to the arc discharging plasma, to a side whereinto the material gas is introduced.
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申请公布号 |
US5340621(A) |
申请公布日期 |
1994.08.23 |
申请号 |
US19930035672 |
申请日期 |
1993.03.23 |
申请人 |
NIPPON SHEET GLASS CO., LTD. |
发明人 |
MATSUMOTO, MINORU;OGINO, ETSUO;TSUNO, TOSHIO |
分类号 |
H01L21/205;C23C16/513;H01J37/32;H05H1/50;(IPC1-7):B05D3/06 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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