| 摘要 |
<p>PURPOSE:To enable the provision of address display of pixels for each of respective pixels without lowering transmittance and to make the assignment of the specific pixels, such as defects possible, by providing address display patterns of pixel coordinates on the light shielding films of a display part. CONSTITUTION:An SiN film is deposited as a second layer insulating film 9. A resist film 10 having apertures on source electrodes 8S and store capacitors is then formed by photolithography on a substrate 1. The apertures on the store capacitors are formed into shape of a figure, etc., as the address display patterns at this time. The second layer insulating film 9 is then etched having the resist film 10 as a mask to form contact holes. The resist film 10 is thereafter removed. The resin on connecting terminals is simultaneously etched away at this time. The contact holes of the shapes of the figures, etc., indicating the addresses are formed on the store capacitors at this time. An ITO film 11 is then formed as a pixel electrode film and is patterned to attain contact with the electrodes 8C in the upper part of the store capacitors and source electrodes 8S to form the pixel electrodes. The TFT matrix is thus formed.</p> |
