DETECTING METHOD FOR ABNORMAL DISCHARGE AND PLASMA DEVICE

摘要

PURPOSE:To detect presence or absence of abnormal discharge which is generated in a treatment chamber of a plasma device and its generation part. CONSTITUTION:The device for treating a semiconductor wafer W which is placed at an electrostatic chuck 21 by generating plasma in a treatment chamber 1 by a high-frequency power supply 8 is provided with a current monitor 77 for detecting DC voltage for operating the electrostatic chuck 21 and a VDC monitor 74 for detecting the VDC level from a power supply line 11 of the high- frequency power supply 8. The monitor signal from each monitor is compared and processed by a detection device 75, thus detecting presence or absence of abnormal discharge and its generation part according to comparison processing by a detection device 75 even if the fluctuation width etc. of each monitor signal differs depending on the generation part of abnormal discharge.