发明名称 RESISTANCE ADJUSTING METHOD AND RESISTOR AND RESISTANCE ADJUSTING DEVICE
摘要 <p>PURPOSE:To adjust a resistance value by forming a passage for electrolyte on the resistance precursor made on a substrate or the like, and also, applying voltage between the resistance precursor and the electrolyte so as to oxidize the resistance precursor. CONSTITUTION:A photoresist 12 is formed on the surface of a substrate 3 where a resistance precursor 4 and an electrode 11 are formed, and then this substrate 3 is attached to a resistance adjusting device 1. Next, electrolyte 2 is let flow in through an opening 5d, and the electrolyte 2 on the resistance precursor 4 is sucked through the suction part 6b of a suction pipe 6. And, a probe 8 is abutted on an electrode 11a while observing the resistance value of the resistance precursor 4, and large voltage is applied. When the resistance precursor 4 reaches a desired resistance value or its vicinity, the probe 8a is removed, and a probe 8b is abutted against the electrode 11b, and a variable resistor 10 is adjusted, and small voltage is applied, and when the resistance value reaches aryallowable range, the electrode 11b is removed. Hereby, a nonconductor layer is formed on the surface layer of the resistance precursor, and a resistor, which has accurate resistance value, can be obtained.</p>
申请公布号 JPH06231912(A) 申请公布日期 1994.08.19
申请号 JP19930019094 申请日期 1993.02.05
申请人 JGC CORP 发明人 SAITO TOSHIYUKI;MURATA TAKEO
分类号 H01C7/00;H01C17/26;(IPC1-7):H01C17/26 主分类号 H01C7/00
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