| 摘要 |
PURPOSE:To provide a photosensitive resin compsn. excellent in both stability of the photosensitive liq. and water resistance after exposure, especially a photosensitive resin compsn. fit for a relief printing plate or a screen printing plate. CONSTITUTION:This photosensitive resin compsn. consists of an emulsion (A) of a hydrophobic resin having >=45 deg.C glass transition temp. such as polymethyl methacrylate, polyvinyl chloride or polystyrene, polyvinyl alcohol resin (B), a polymerizable monomer (C) such as methyl methacrylate or methyl acrylate and a photopolymn. initiator (D). The amt. of the hydrophobic resin in the emulsion A is 10-30wt.% and the amt. of the resin B is 10-30wt.% of the total amt. of the resin B and the monomer C. |
