| 摘要 |
There is provided a variable capacitance diode device. The device comprises a semiconductor substrate of a first conductive type, an epitaxial layer of the first conductive type with a high specific resistance formed on the semiconductor substrate, a first diffusion layer of the first conductive type, in which impurities are more diffused than the epitaxial layer, formed in the epitaxial layer and a second diffusion layer of a second conductive type which forms a junction with the first diffusion layer. The first diffusion layer is formed in a hollow cylindrical body or a hollow square pole body, etc., so as to enlarge an outer peripheral area thereof.
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