发明名称 |
Phenolic novolak resin compositions containing 5-indanol and their use a process for forming positive resist patterns |
摘要 |
A phenolic novolak resin composition comprising a condensation product of at least one aldehyde source with a phenolic source comprising 5-indanol. Said phenolic novolak resins are used in radiation-sensitive compositions, especially those useful as positive-working photoresists.
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申请公布号 |
US5338653(A) |
申请公布日期 |
1994.08.16 |
申请号 |
US19940194193 |
申请日期 |
1994.02.09 |
申请人 |
OCG MICROELECTRONIC MATERIALS, INC. |
发明人 |
TOUKHY, MEDHAT A. |
分类号 |
C08G8/08;G03F7/023;(IPC1-7):G03F7/30 |
主分类号 |
C08G8/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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