发明名称 Masks for applying dots on semiconductor wafers
摘要 A mask and an assembly utilizable in the production of a multiplicity of capacitors on selected regions of a semiconductor wafer includes a shaped, thin sheet of material having spaced-apart holes made therein and at least one recess formed adjacent each of at least two opposite edges thereof, the recess being configured to be engaged by a substantially matching portion of a clamp releasably affixing the mask onto the wafer.
申请公布号 US5338424(A) 申请公布日期 1994.08.16
申请号 US19920998135 申请日期 1992.12.29
申请人 PERSYS TECHNOLOGY LTD. 发明人 DRIMER, GIDEON;GLAZER, ARIE
分类号 C23C14/04;G03F1/16;H01L21/66;H01L23/544;(IPC1-7):C23C15/00 主分类号 C23C14/04
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