| 摘要 |
PURPOSE:To obtain a cantilever wherein it does not obstruct a photolithographic process in a halfway process, it eliminates a need of giving a warp amount mechanically, it can be massproduced and it is provided with a controlled warp amount. CONSTITUTION:In a cantilever which is used for a micromachine, one end part can be displaced microscopically and the other end part is fixed. In the cantilever, at least one end part is provided with a silicon substrate 1 and with a nickel-iron-plated film 3 formed on the silicon substrate 1. |
