发明名称 MASK PATTERN INSPECTING DEVICE
摘要 PURPOSE:To decrease the frequency of inspection for searching for data excluded from objects of processing by slit areas by regarding layout data which have a common value as one group as to coordinates crossing the length direction of slits at right angles. CONSTITUTION:A stripped area specifying device 21 specifies a stripped area which is thin and long on a mask pattern, i.e., a slit area. A reader 24 reads graphic data positioned in the stripped area out of an auxiliary storage device 22 to a main storage device 23. A group setting device 25 for data groups graphic data having common position coordinates as to the coordinate axis crossing the length direction of the stripped area at right angles and sets data representing the respective groups in the respective groups. A delivery/deletion deciding device 27 detects representative data which is not included in the aimed stripped area. A data deletion device 28 deletes the detected representative data and graphic data in it from the main storage device 23. Consequently, the processing can be speeded up.
申请公布号 JPH06223132(A) 申请公布日期 1994.08.12
申请号 JP19930010207 申请日期 1993.01.25
申请人 FUJI XEROX CO LTD 发明人 HAYASHI KAZUTAKA
分类号 G03F1/68;G03F1/70;G06F17/50;H01L21/027 主分类号 G03F1/68
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