SYSTEM AND METHOD FOR AUTOMATIC POSITIONING OF SUBSTRAE INSIDE TREATMENT CHMBER

摘要

PURPOSE: To provide an improved position-controlling means for operating robot handling. CONSTITUTION: This system and method decides the center point of a moving object, such as a wafer 5 and corrects a supporting blade 4a. A sensor array 6 is arranged in a direction almost horizontal to the circular-arc orbit of the motion of the wafer 5 and the blade 4a for detecting the relative positions of the wafer 5 and the supporting blade 4a to a selected target position 65b for exactly positioning the wafer 5 to the selected target position 65b.