| 摘要 |
PURPOSE:To obtain a layout pattern generating device to generate a mask layout plot which can accurately realize operational characteristics preliminarily determined in a symbolic layout plot. CONSTITUTION:The layout pattern generating device to generate a mask layout plot 5 of IC chips is generated from the symbolic layout plot used for designing layouts of IC chips. This device is equipped with a means 12 to extract cell characteristics from previously generated mask layout figure 1 and a compacting means 4. By the compcting means 4, the symbolic layer plot is subjected to compaction treatment according to technology role 3 and the cell characteristics information extracted by the means 12 to generats the mask layout plot 5. |
