| 摘要 |
<p>PURPOSE:To provide a method for measuring the spatial beam intensity distribution (beam pattern) precisely in which problems of detecting element, e.g. deterioration of sensitivity, damage, shortening of service life, are solved over a wavelength region from X-ray to ultraviolet ray. CONSTITUTION:The intensity distribution of original laser beam is measured indirectly from a surface fluorescence intensity distribution detected through a fluorescence detecting element D by focusing a fluorescent surface light source emitted from a laser through a lens L' using a fluorescent plate F having a thin fluorescent layer generating sufficient fluorescence in visible wavelength region which is linear with respect to the intensity of objective short wavelength laser beam, e.g. X-ray or UV ray. The inventive method allows the precise measurement of laser distribution on the surface of an actual sample placed in a sample moving system, a sample holder, or a vacuum chamber C. The invention also provides an absorber method for preventing measurement error due to the reflection of laser light and a damper method for enhancing measurement accuracy.</p> |
