| 摘要 |
PURPOSE: To provide a photolithographic etching method for accurately and uniformly manufacturing a wire screen disk having a different composite configuration size for use in a regenerator of a cryogenic cooler. CONSTITUTION: This photolithographic etching method comprises processes wherein a photoresist is applied on a wire screen sheet 18, and the photoresist is developed into one or more of desired disk configurations, and further the developed wire screen sheet 18 is etched to form the wire screen disk 10. The present method is usable for manufacturing a wire screen disk having various composite configuration sizes, thus allowing for the construction of cryogenic cooler having a complicated but more efficient configuration. |
