Substrate carrier for treatment apparatus

摘要

The invention relates to a substrate carrier for treatment apparatus, in particular vacuum treatment chambers of ion beam- or plasma-etching units, for the treatment of two-dimensional substrates (6), which require cooling during the treatment, the substrate carrier having a bench (2), which forms a substantially flat resting surface (4) for the substrate and is cooled by a flowing coolant which is kept separate from the substrate and resting surface, and clamping means for holding the substrate on the resting surface. The clamping means are formed by a frame-shaped mounting (26) for the substrate, the bench being movable relative to the mounting perpendicularly to the resting surface. This ensures a largely uniform contact pressure of the substrate on the bench, while at the same time the substrate can be changed in a simple manner which can easily be automated. <IMAGE>