Curable composition and process for producing shadow mask using the same

摘要

A curable composition comprising the following components (a), (b), (c) and (d) and/or (e): (a) a compound having one carboxyl group and one (meth)acryloyl group in the molecule, (b) a compound having two or more (meth)acryloyl groups in the molecule, (c) a levelling agent, and (d) a chain transfer agent and/or (e) a tertiary amine type photoinitiator; and a process for producing a shadow mask, comprising two etching steps, wherein the above curable composition is used as a secondary etching resist material.