发明名称 Method for patterning an optical device for optical IC, and an optical device for optical IC fabricated by this method
摘要 A method of patterning an optical device for an optical IC whose purpose is to diffract a light beam incident on one surface of a device substrate to cause a light beam to emerge from another surface of the device. In this method, a layer of a substance of variable refractive index is formed on an optical substrate, coherent light is caused to irradiate the layer from the direction of the normal to the surface which will be the incidence side of the device when it is used or from the opposite side, and coherent light is caused to irradiate the layer from the direction of the normal to the surface which will be the emergence side of the device when it is used or from the opposite side to form an interference pattern on the layer that performs diffraction.
申请公布号 US5337169(A) 申请公布日期 1994.08.09
申请号 US19930024110 申请日期 1993.02.23
申请人 KABUSHIKI KAISHA TOPCON 发明人 HORI, NOBUO;TAKANO, YOSHINOBU;TAKAHASHI, TAKASHI;NAGANO, SHIGENORI;HASHIMOTO, REIJI
分类号 G02B6/13;G02B5/32;G02B6/12;G02B6/124;G03F7/20;H01L21/027;(IPC1-7):G02B5/32;G02B6/34;G03H1/04 主分类号 G02B6/13
代理机构 代理人
主权项
地址