发明名称 |
Method of manufacturing main plates for exposure printing |
摘要 |
In order to manufacture a pair of main plates closely contacted with both the faces of a member to be exposed to light, patterns are drawn on a pair of original dry plates by a main pattern drawing device and developed. Thereafter, the developed pattern formed on one of the pair of original dry plates is successively transcribed even times in such a manner that a transcribed pattern having just formed on a newly supplied dry plate at a prior transcription is now transcribed to a fleshly supplied dry plate at a next transcription, and the developed pattern formed on the other one of the pair of original dry plate is successively transcribed odd times in such a manner that a transcribed pattern having just formed on a newly supplied dry plate at a prior transcription is now transcribed to a fleshly supplied dry plate at a next transcription, thereby forming a pair of main plates.
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申请公布号 |
US5336587(A) |
申请公布日期 |
1994.08.09 |
申请号 |
US19930015291 |
申请日期 |
1993.02.08 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
TANAKA, HIROSHI;KUDOU, MAKOTO |
分类号 |
G03F1/00;H01J9/14;(IPC1-7):G03C5/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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