发明名称 Method of manufacturing main plates for exposure printing
摘要 In order to manufacture a pair of main plates closely contacted with both the faces of a member to be exposed to light, patterns are drawn on a pair of original dry plates by a main pattern drawing device and developed. Thereafter, the developed pattern formed on one of the pair of original dry plates is successively transcribed even times in such a manner that a transcribed pattern having just formed on a newly supplied dry plate at a prior transcription is now transcribed to a fleshly supplied dry plate at a next transcription, and the developed pattern formed on the other one of the pair of original dry plate is successively transcribed odd times in such a manner that a transcribed pattern having just formed on a newly supplied dry plate at a prior transcription is now transcribed to a fleshly supplied dry plate at a next transcription, thereby forming a pair of main plates.
申请公布号 US5336587(A) 申请公布日期 1994.08.09
申请号 US19930015291 申请日期 1993.02.08
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 TANAKA, HIROSHI;KUDOU, MAKOTO
分类号 G03F1/00;H01J9/14;(IPC1-7):G03C5/00 主分类号 G03F1/00
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