| 摘要 |
PURPOSE:To produce a black matrix substrate excellent in flatness and high shielding property at low cost by electroless plating preparing a soln. containing a solid content of a specified wt.% range consisting of polyvinylalcohol and diazo resin. CONSTITUTION:A relief 4 for a black matrix to be formed on a transparent substrate 2 is formed by using a photosensitive material containing 2-8wt.% solid content of polyvinylalcohol and diazo resin. As for the polyvinylalcohol, sulfone group-modified compd. or the like is used. The diazo resin used for the photosensitive material is incorporated as a photosetting photosensitive groups into the photosensitive material. The obtd. relief 4 is flat without wrinkles on its surface. By electroless plating, metal particles are deposited uniformly on the whole relief 4. The obtd. black matrix substrate 1 has high resolution, high optical density and low reflectance. |
