| 摘要 |
PURPOSE:To produce a black matrix substrate excellent in flatness and high shielding property at low cost by electroless plating by preparing a soln. containing polyvinylalcohol having each specified saponification degree and average polymn. degree and a photocrosslinking agent. CONSTITUTION:A relief 4 for a black matrix to be formed on a transparent substrate 2 is formed by using a photosensitive material containing polyvinylalcohol having 65-99.9 saponification degree and 250-2800 average polymn. degree. As for the polyvinylalcohol, modified polyvinylalcohol such as carboxyl group-modified compd. is used. The photosensitive material contains photosetting photosensitive groups as a photocrosslinking agent. By this method, good resolution and sensitivity is obtd., metal particles are deposited uniformly on the whole relief 4 by electroless plating, and the obtd. black matrix substrate 1 has high resolution, high optical density and low reflectance. |
