| 摘要 |
<p>PURPOSE:To prevent the generation of edge domains and an increase in off current by a photocontact and to provide the liquid crystal display device having excellent display characteristics by forming silicon films on protective films. CONSTITUTION:Thin-film transistors TFT and transparent pixel electrodes ITO 1 are formed on a lower transparent glass substrate SUB 1 side with a liquid crystal LC as a reference. Color filters FIL and light shielding films BM of black matrix patterns are formed on an upper transparent glass substrate SUB 2 side. Silicon oxide films SiO formed by a dipping treatment, etc., are provided on both surfaces of the substrates SUB 1, SUB 2. Since the sharp flaws, if any, on the surfaces of the substrates SUB 1, SUB 2 are covered by the silicon oxide films Sin, the quality of the films such as scanning signal lines GL and light shielding films BM, deposited thereon is uniformly maintained.</p> |
