| 摘要 |
PURPOSE:To improve sensitivity and resolution while maintaining performance, such as heat resistance, residual film rate and coatabiltiy, by incorporating a photoacid generating agent contg. the sulfonates of N-hydroxyimide compds., an alkaline-soluble resin, a crosslinking agent and a compd. having naphthalene skeleton into the above compsn. CONSTITUTION:This negative type photoresist compsn. contains the photoacid generating agent contg. at least one kind of the sulfonates of the N- hydroxyimide compds., the alkaline-soluble resin, the crosslinking agent and the compd. having the naphthalene skeleton. The compd. expressed by formula I is preferably used as the sulfonates of the N-hydroxyimide compds. and the compd. expressed by formula II is preferably used as the compd. having the naphthalene skeleton. In the formulas, R<1> denotes a (substd.) arylene, alkenylene group; R<2> denotes a (substd.) alkyl or aryl group. R<3> to R<10> denote a hydrogen atom or (substd.) alkyl group. |
