POSITIVE TYPE RESIST COMPOSITION

摘要

PURPOSE:To ensure high safety to the human body and environment as well as satisfactory properties of a coating film by dissolving an alkali-soluble resin and a compd. having a quinonediazido group in an org. solvent prepd. by mixing specified compds. in a specified ratio. CONSTITUTION:An alkali-soluble resin and a compd. having a quinonediazido group are dissolved in a solvent prepd. by mixing 100 pts.wt. keto-carboxylic ester with 50-400 pts.wt. 2-alkyl oxypropionate to obtain the objective positive type resist compsn. The alkali-soluble resin is preferably alkali-soluble novolak resin and the compd. having a quinonediazido group is used as a photosensitive component. When the mixed solvent used as an rog. solvent has a mixing ratio deviating from the above-mentioned range, properties of a coating film deteriorate. The ketocarboxylic ester is preferably ethyl pyruvate.