REFLECTION TYPE HOMOGENIZER AND REFLECTION TYPE ILLUMINATING OPTICAL DEVICE

摘要

PURPOSE:To eliminate the damage of glass material and the lowering of light quantity and to obtain uniform illumination with good efficiency by replacing an optical element with a reflection mirror in a semiconductor exposure device in which extreme ultraviolet rays are set as a light source. CONSTITUTION:Light from the light source 11 is converted into a desired luminous flux by a beam converter 14 consisting of parabolic mirrors 12 and 13. The luminous flux forms a secondary light source on the reflection type homogenizer 17 of a parabolic reflection mirror array by plane reflection mirrors 15 and 16. The luminous flux forming the secondary light source array on the focusing surface of the homogenizer 17 is made incident on an illuminating lens 18 and uniformly illuminates a reticle 19. The image of the reticle is reduced and projected on a wafer surface by an image-formation element.