| 发明名称 |
SURFACE CLEANING METHOD AND APPARATUS THEREBY |
| 摘要 |
The apparatus includes a dilution cistern for preparing a cleaning solution, a deionized water supplying tube for supplying deionized water to the dilution cistern, a cleaning solution supplying tube for supplying cleaning solution prepared in the dilution cistern to a cleaning cistern HF supplying tube, thereby performing wet etching.
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| 申请公布号 |
KR940007061(B1) |
申请公布日期 |
1994.08.04 |
| 申请号 |
KR19910020153 |
申请日期 |
1991.11.13 |
| 申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK, TAE - HUN;SHIM, TAE - ON;KIM, YONG - KWAN;KO, YONG - SON |
| 分类号 |
H01L21/304;(IPC1-7):H01L21/304 |
主分类号 |
H01L21/304 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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