| 摘要 |
<p>A system automated for providing at least periodic removal of metal ions and contaminants from a chemical bath (T4), consists of a microprocessor programmed for controlling fluid circuits of pumps (P1, P2, P3) and valves (AV1, AV2, AV3, AV4, AV5, AV6, AV7), for in one state of operation circulating a first predetermined quantity of the chemical bath from a first tank (T4), through an ion exchange column, and back to the first tank; for in a second state of operation circulating deionized water from a second tank (T1), into the IEX column for displacing residual chemical bath therefrom for return to the first tank; for in a third state of operation circulating deionized water through the IEX column, and discharging the rinse water from a waste port; for in a fourth state of operation circulating regenerant acid (T2) through the ion exchange column, and discharging the used acid from a waste port; for in a fifth state of operation circulating deionized water through the IEX column for rinsing acid regenerant therefrom and discharging the same out of a waste port; and for in a sixth state of operation circulating chemical bath into the IEX column for displacing residual rinse water therefrom, and discharging the same out of the waste port, in preparation for a cycle of treatment of the chemical bath.</p> |
