发明名称 |
Positive-type photosensitive resin compositions. |
摘要 |
<p>A positive-type photosensitive resin composition containing a resin which results from reactions between a specific polyepoxide compound, a carboxylic acid compound having a specific phenolic hydroxyl group, a carboxylic acid compound having no specific phenolic hydroxyl group, and 1, 2 - quinone diazide sulfonyl halide. The resin composition has high exposure sensitivity, is capable of inhibiting swell or dissolution of unexposed areas during the stage of development, and yet retains other favorable properties. The resin composition has also attained short developing time.</p> |
申请公布号 |
EP0608894(A1) |
申请公布日期 |
1994.08.03 |
申请号 |
EP19940101283 |
申请日期 |
1994.01.28 |
申请人 |
NIPPON PAINT CO. LTD. |
发明人 |
OTSUKA, CHIKAYUKI;SEIO, MAMORU;SAKURAI, KIYOMI;KAWAMURA, KAZUYUKI |
分类号 |
G03F7/023;G03F7/16;(IPC1-7):G03F7/023 |
主分类号 |
G03F7/023 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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