发明名称 VAPORRLIQUID CONTACT APPARATUS
摘要 <p>PURPOSE:To prevent the decrease in the efficiency of vapor-liquid contact by making the number of holes near the walls provided on plates larger than that in the central part. CONSTITUTION:Plates 3 are trisected to the area A sandwiched by linear weirs 8 and the areas B, C sandwiched by auxiliary weirs 7 and the number of holes is made larger on the tower wall sides B, C than that in the central part A. Even if with the apparatus constituted in this way the rate of liquid flow flowing down into a downcomer 2 beyond the auxiliary weirs 7 is high, distillation has propressed more near the tower walls than in the central part and therefore said liquid becomes of the same composition as that of the liquid flowing down into the downcomer 2 beyond the linear weirs 8. Since the number of holes near the tower walls is greater, the upward gas current 10 passing hear the tower walls increases and the downward liquid flow on the trays 3 is blown away and is corrected in the central part of the trays 3, thus the liquid depth distribution on the trays 3 becomes even. Hence, the entire downward liquid flow 9 has the same residerce time and therefore the degradation in performance owing to oscillation of the tower may be prevented.</p>
申请公布号 JPS5549101(A) 申请公布日期 1980.04.09
申请号 JP19780121632 申请日期 1978.10.03
申请人 MITSUBISHI HEAVY IND LTD 发明人 YONEDA KENICHI;MAKI MASATOSHI
分类号 B01D3/16;B01D3/22;B01D3/32;B01D53/18;B63J99/00 主分类号 B01D3/16
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