| 摘要 |
PURPOSE:To provide a titanium nitride sputtering target hardly generating particles at the time of sputtering and capable of stably forming a high quality titanium nitride film. CONSTITUTION:This titanium nitride sputtering target is made of a bonded body of titanium nitride particles formed by sintering and nitriding Ti particles and pores having 5-20mum average diameter exist in this target by 100-500 per 1mm<2> area, or pores having 5-20mum average diameter exist in this target by 100-500 per 1mm<2> area and the ratio of the average particle diameter of the titanium nitride particles to the average diameter of the pores is 1-100. The pores and the titanium nitride particles are controlled by regulating Ti powder as starting material, sintering conditions, etc. |
