METHOD OF FINELY POLISHING PLANAR OPTICAL ELEMENTS

摘要

The present invention relates to a method of finely polishing an optically transparent surface with a polishing liquid containing abrasive particles. The polishing mixture, while subjected to ultrasonic agitation, is contacted with an optically transparent surface under conditions effective to polish finely that surface. The abrasive particles typically have a size of up to 1 micron. This process is particularly useful in smoothing the optically transparent surfaces which define cavities or sidewalls for planar optical elements in optical waveguides.