发明名称 Verfahren zur Herstellung eines Quarzglasgefässes für Halbleiter-Einkristallzüchtung.
摘要 <p>A quartz glass crucible adapted for use in a process for pulling a single crystal semiconductor material having an opaque outer substrate of a quartz glass with a relatively high bubble content and an inner transparent glass layer which is substantially free from bubbles. The crucible is produced while the substrate is supported by a rotating mould by forming an atmosphere of high temperature gas and supplying a metered quantity of powders of quartz to the high temperature gas atmosphere to have the quartz powders molten at least partly and directed toward an inner surface of the substrate to be adhered thereon.</p>
申请公布号 DE3888797(T2) 申请公布日期 1994.07.28
申请号 DE19883888797T 申请日期 1988.12.02
申请人 SHIN-ETSU HANDOTAI CO., LTD., TOKIO/TOKYO, JP;SHIN-ETSU QUARTZ PRODUCTS CO., LTD., TOKYO, JP 发明人 UCHIKAWA, AKIRA, TAKEFU-SHI FUKUI-KEN, JP;IWASAKI, ATSUSHI, TAKEFU-SHI FUKUI-KEN, JP;FUKUOKA, TOSHIO, SABAE-SHI FUKUI-KEN, JP;MATSUI, HIROSHI, TAKEFUSHI FUKUI-KEN, JP;MATSUMURA, MITSUO, TAKEFU-SHI FUKUI-KEN, JP;SATO, YASUHIKO, ANNAKA-SHI GUNMA-KEN, JP;AOYAMA, MASAAKI, KOURIYAMA-SHI FUKUSHIMA-KEN, JP;SHINOMIYA, EIICHI, OHTA-KU TOKYO, JP;FUJINOKI, AKIRA, KOURIYAMA-SHI FUKUSHIMA-KEN, JP;OGINO, NOBUYOSHI, MUSASHINO-SHI TOKYO, JP
分类号 C03B19/09;C30B15/10;C30B35/00;(IPC1-7):C30B15/10 主分类号 C03B19/09
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