发明名称 High performance MESFET with multiple quantum wells.
摘要 <p>A superheterojunction Field Effect Transistor (FET) with a multi-region channel on a Silicon (Si) substrate (204). The FET is a Metal Semiconductor FET (MESFET) or, alternatively, a Junction FET (JFET). The multi-region channel has: a first region (250) of Si extending from the FET's source to a point under the FET's gate, beyond the gate's midpoint; a second region extending from the first region to the FET's drain (240), comprised of a superlattice of alternating Si and SiGe layers (206); and, a third region (202) of Si extending under the first two regions from the source to the drain. The first region has a laterally graded dopant that creates an accelerating electric field. The superlattice structure increases electron mobility and transit velocity. <IMAGE></p>
申请公布号 EP0607729(A2) 申请公布日期 1994.07.27
申请号 EP19930480207 申请日期 1993.12.03
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 MOHAMMAD, NOOR S.;RENBECK, ROBERT BUCH
分类号 H01L21/337;H01L21/338;H01L29/10;H01L29/778;H01L29/808;H01L29/812;(IPC1-7):H01L29/808 主分类号 H01L21/337
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