发明名称 MATERIAL TREATING SYSTEM FOR IMMERSION COATING PROCESS
摘要 PURPOSE: To obtain a material handling system used for a dip coat process for production of a plurality of multilayer photoconductive members by providing the system with a second transporting means for putting workpieces into and out of a dipping station and transporting the workpieces in the state of mounting the workpieces to a carrier means. CONSTITUTION: The material handling system for dip coating of the plurality of workpieces 11 for sticking coating material layers thereto has a carrier pallet to accept the plurality of workpieces 11, the dipping station 40 for sticking the respective coating material layers of the plurality of workpieces 11 and a loading pallet perpendicular lift 20 for transporting the carrier pallet within a first plane so as to position the workpieces 11 on the dipping station 40. The carrier pallet is transported by a carrier pallet horizontal transporting system 22 within the second plane perpendicular to the first plane, i.e., within the horizontal plane, so as to transport the workpieces 11 by putting the workpieces into and out of the dipping station 40 in the state of mounting the workpieces 11 at the carrier pallet.
申请公布号 JPH06206030(A) 申请公布日期 1994.07.26
申请号 JP19930302136 申请日期 1993.12.02
申请人 XEROX CORP 发明人 SUTANREI JIEI PIITORUJIIKOUSUKII JIYUNIA;AREKUSANDAA EI ANTORI;JIYON JIEI DAASHII ZA SAADO;RICHIYAADO SHII PETORARIA;MAAKU SHII PETAROPOUROSU;PEETAA JIEI SHIYUMITSUTO;PATORITSUKU AARU SHIYAAN;YUUJIIN EI SUUEIN;MAAKU ESU TOOMASU;AREN DEII SUMISU
分类号 B05C3/09;B05C13/02;B65G49/04;(IPC1-7):B05C3/09 主分类号 B05C3/09
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